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Nikon Metrology NV | Europe
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Eclipse LV150NL - Digital imaging combined with advanced optical system with LED illumination

nikon metrology industrial microscopes upright LV150NL

A manual, nosepiece type microscope which meets the various needs of observation, inspection, research and analysis across a wide range of industrial fields. Higher NA and a longer working distance than ever before means superior optical performance and efficient digital imaging.
Max. sample size: 150 x 150 mm

Key benefits

  • Modularized microscope body applicable with various observations and tasks
  • Newly developed CFI60-2 series provides the ultimate in long working distance levels and the most advanced chromatic aberration in a light weight body
  • Easy digital imaging
  • ECLIPSE LV150NL with LED illumination

Applications

  • Antennae
  • Telecom & Electronics
  • Telescope optics
  • Mobile phones, shavers & watches
 
Benefits & features
 

Microscope type

  • Dedicated reflected illumination models
  • Manual type

ECLIPSE LV150NL with LED illumination

An environmentally friendly version of the LV150NL which consumes less power through long-life LED illumination is also available.

Modularized microscope body applicable with various observations and tasks

Compatible with brightfield, darkfield, simple polarizing, DIC, epifluorescence and two-beam interferometry observations.
It supports diverse and advanced research, analysis and inspection.

Compatible observation methods:

nikon metrology industrial microscopes upright compatible observation methods LV150NL

*Select suitable lens for each observation


Compatible stages

  • LV-S32 3x2 stage (Stroke: 75 x 50 mm with glass plate)
    *Can be fitted with LV-S32SPL ESD plate
  • LV-S6 6x6 stage (Stroke: 150 x 150 mm)
    *Can be fi tted with LV-S6WH wafer holder / LV-S6PL ESD plate
  • LV-SRP P revolving stage
  • P-GS2 G stage 2 (Used with stage adapter LV-SAD)

Newly developed CFI60-2 series

Newly developed CFI60-2 series provides the ultimate in long working distance levels and the most advanced chromatic aberration in a light weight body

CFI60-2 series offers higher NA and longer working distances than ever before.

nikon metrology industrial microscopes upright Eclipse objectives for brightfield observation

Objectives for brightfield observation (epi)


Easy digital imaging

nikon metrology industrial microscopes upright digital imagingInformation about the objective in use is detected and displayed on the camera control unit. In addition, the information is automatically converted into appropriate calibration data when changing magnification.

  • Digital Camera System for Microscopy Digital Sight Series
  • Imaging Software NIS-Elements
 
Brochures
Industrial Instruments General Catalogue
Industrial Instruments General Catalogue

en de

Overview brochure
Overview brochure

en fr de

LV-N
LV-N

en de

 

Brochures

Industrial Instruments General Catalogue
Industrial Instruments General Catalogue

en de

Overview brochure
Overview brochure

en fr de

LV-N
LV-N

en de