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OPTISTATION 3100 - A compact solution for 300mm wafer inspection in diverse applications.

nikon metrology semiconductor inspection optistation 3100Engineered to provide cost-effective support for 300mm wafers with a minimal footprint, the Optistation-3100 features an advanced micro/macro system in a compact, flexible design. The optical system offers brighter images, and observation techniques can be programmed for each objective magnification and each substrate layer to be inspected.


  • Wafers
Benefits & features

Three Mode Macro Inspection with High Performance Illuminators

Allows surface Macro, center backside Macro, and perimeter backside Macro inspections. Furthermore, the wide illuminator WIL-100 and the line illuminator LIL-100 have been newly developed to detect various process defects.

Built for Factory Automation

The Optistation-3100 features a SEMI and SELETE compliant design to enable easy adaptation to diverse 300mm factory automation requirements.

Flexibility in Load Port Positioning

With load port positions available in the front, side and rear, the Optistation-3100 is adaptable to diverse fab layouts and 300mm factory automation requirements. What's more, it features a smaller footprint and compact design.

Easy Operation

Automated, motorized functions controlled by an easily accessible touchscreen ensure comfortable operation while minimizing contamination. Optimum observation settings, including aperture and light intensity, can be preset according to objective lens or wafer type.

Contamination Free Inspection

An integrated environmental chamber and FFU (fan filter unit) prevent contamination by particles, easily ensuring a class 1 inspection environment.

CFI60 Optical Design

Nikon’s renowned CFI60 optics produce crisp, clear images with high contrast and minimal flare. Longer working distances throughout the magnification range ensure safer wafer inspection. The darkfield signal-to-background ratio is three times higher than in the past, ensuring significantly better imaging.

DUV Microscope

The newly designed DUV microscope module supports 90nm and future design rules.

Wafer size: 300mm
Microscope (micro) inspection: Total Magnification: 25x to 1500x; Inspection modes: Brightfield, darkfield, DUV (option); Autofocus: LED illumination slit projection; Objectives: CFI60 objectives
Macro inspection: Surface Macro, center backside Macro, perimeter backside Macro
Load port: 1 foup (or 1 FOSB: option); Position selectable from front, side or rear
Wafer transfer: Robotic handling; vacuum chuck; noncontact pre-alignment mechanism
Operation: Touch panel GUI, mouse, keyboard
Options: DUV microscope: Switchable to B/D; Online operation: Via SECS-I or HSMS; Communication with host computer: 300mm SEMI standards (Complaint with E5, E7, E30, E37, E39, E40, E87, E90, E94); Others: FOSB compliance, ULPA boronless FFU (fan filter unit), Video capture function, 2nd user interface (UIF), OHV (SEMI E84 compliance), Review inspection, ADC, OCR
Safety: S2-0200 compliance, CE marking compliance
Ergonomic: S8-1000 compliance
Dimensions (W x D x H): 1785 x 1650 x 2300mm; Rear load port: 70.1 x 65.0 x 90.6 in.
Weight: Main body: Approx. 760kg (1676 lb); FFU unit: Approx. 160kg (353 lb)


Contact Us
42.517726, -83.698139

Nikon Metrology, Inc

12701 Grand River Avenue
Brighton, MI 48116
United States

Email: sales.nm-us@nikon.com
Website: www.nikonmetrology.com
Telephone number: (810) 220-4360

33.649429, -117.710097

Nikon Metrology, Inc (California)

12 Goodyear, Suite #105
Irvine, CA 92618
United States

Email: sales.nm-us@nikon.com
Website: www.nikonmetrology.com
Telephone number: (949) 716-4440

32.916631, -96.986003

Nikon Metrology, Inc (Texas)

8113 Ridgepoint Dr.
Irving, TX 75063
United States

Email: sales.nm-us@nikon.com
Telephone number: (810) 220-4360