Nikon Metrology's most advanced microscopes for inspecting the latest wafer types using both Episcopic and Diascopic optical contrast methods
Featuring Nikon's most advanced optics for unparalleled inspection of the latest wafer types.
Nikon Eclipse L300N/L300ND FPD / Wafer Inspection microscopes incorporate Nikon’s renowned CFI60 infinity optics, offering the world’s highest level of optical performance. The enhanced epi-fluorescence function, which enables 365nm UV excitation, is optimal for the inspection of semiconductor resist residues on 300mm wafers and organic electroluminescence displays.
Applications are centered around inspection duties in the electronics and telecommunication sectors. Antennae waveguides are measured with utmost precision as well as other components. Wafers for semiconductor or photovoltaic devices, for micro electro mechanical systems (MEMS) used in components for example, smartphones, gyroscopes, and accelerometers.
Benefits & features
Enhanced range of contrast methods
L-series microscopes are capable of Diascopic illumination (ND models). All have Episcopic illumination for brightfield, darkfield, simple polarising and differential interference contrast (DIC) microscopy. The wide range of contrasting techniques suits challenging materials and component features. Photoresist residues can be identified, observed and recorded, even down to 365 nm UV epifluorescence excitation.
Choice of effective lamphouses
A choice of lamp units is available to suit different applications according to the material and the optical contrast, as well as desired service life and power consumption.
High-intensity 12V-50W halogen illuminator
The innovative, high intensity, 12V-50W halogen illuminator is actually brighter than the former standard 12V-100W illuminator.
LED illuminator option
The compact LED unit permits uninterrupted inspection sessions, as no filament failures are possible. Energy consumption is significantly reduced.
Motorised, durable, universal nosepiece
Up to six objectives can be mounted at the same time. Excellent parcentricity of the objective lenses minimises shifting of the image when an objective is changed, saving time by avoiding disorientation at the region of interest. This allows stable observation from high to low magnification while maintaining the same image position.
To protect the operator’s eyesight, an illumination anti-flash mechanism engages when the microscope nosepiece is rotated and an objective lens is changed.
Tilting, trinocular, widefield eyepiece tube
The eyepiece has an ultra-wide 25mm field of view and angle adjustment between 0 and 30 degrees. Controls and knobs are positioned low and close to the operator, while the eyepoint is set at the ideal height for comfortable operation.
The eyepiece is positioned close to the operator so that he or she can assume a more erect sitting posture. This also positions the operator farther from the stage to provide a more ergonomic and safe viewing position and protect the object from operator contamination.
Controls at the front of the microscope
The main control knobs and buttons are located at the front of the microscope for easy access, making microscope operation for viewing samples quick and easy. With the controls located conveniently in the microscope base, hand movement is minimal, allowing concentration on the inspection process. The X Y drop control is ergonomically positioned, so constant access to focus adjustment is always maintained, minimising fatigue during lengthy inspection sessions.
Optical Target for easy and precise focusing
Inserting a target in the optical path allows easy and accurate focusing on low-contrast samples, such as bare wafers. Rapid focusing on areas of the sample with no guide features is possible. It saves a considerable amount of time and gives confidence to the user that he or she is in the right focus position.
NIS Elements: Nikon Imaging Software
NIS Elements manages Nikon Digital Sight cameras to capture the best images and organise them and process versions logically in a smooth workflow. Fast, powerful imaging tools are enabled, such as:
- mosaic creation from multiple images of a surface, e.g. following a long microcrack from start to finish
- extended depth of focus (EDF) ,where an enhanced depth of focus view is provided as an image stack, or a single image is formed only from points of sharp focus.
The upgradable concept balances the software modules and capabilities purchased with a user’s needs satisfied.
Nikon Metrology’s Strategic Partners
Nikon Metrology’s supplier partnership program offers an exceptionally high degree of communication and solution development. It delivers a valuable combination of in-house products together with those from selected third-party solution providers.
- Eclipse L300N/ND (Europe)
- The Image Source. A wide range of digital camera solutions for routine applications
- Märzhäuser & Prior. Solutions with motorised stages for process automation
- Inspectis. A macro view of large areas such as for weld inspection alongside the microscopic capability of the stereo microscopes